Sub-100 nm Channel Length Organic Field Effect Transistor Fabricated by Wafer-Scale Nanoimprint Lithography

Zusatztext

This thesis was performed between October 2010 and October 2013 at the Institute of Semiconductors and Microsystems (IHM) of the Technische Universität Dresden (TU Dresden). The main task of this work was fabrication of short channel Organic Field Effect Transistors (OFET) using Nanoimprint Lithography (NIL). Both the UV based NIL and the thermal based NIL with wafer-scale polymer templates were applied to define OFET channel with lengths down to sub-100 nm range. A new technique termed NIL assisted Inkjet Printing (IJP) was developed that successfully achieved submicron range resolution. Fabricated devices were comprehensively characterized including DC and AC performances.

Autorenportrait

Mr. Lichao Teng was born on 01/12/1984 in Yangzhou, Jiangsu, China. He obtained his Bachelor of Science degree in Electrical Engineering in 2006 from the Nanjing University of Science and Technology in China. In 2010, Mr. Teng received his German diploma degree (Dipl.-Ing., equivalent to Master of Science) in Microelectronics from the TU Dresden. He finished his PhD thesis in 2013 with the financial support from the international, DFG funded research training group (Graduiertenkolleg) on "Nano- and Biotechnologies for Packaging of Electronic Systems". Currently, Mr. Teng works at the IHM of TU Dresden in field of organic electronics and nano-patterning.

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